Tantalum Sputtering Target

Tantalum Sputtering Targets: Crafted for Superior Coating Performance

Tantalum sputtering targets are high-purity materials used in coating processes. They stand out due to their uniform grain structure, exceptional density, and remarkable corrosion resistance.

Our tantalum sputtering targets are precision-engineered for peak performance, ideal for advanced coating applications in research and industrial settings. We focus on delivering targets of the utmost quality, tailored to meet the specific demands of your projects.

At AEM Metal, we ensure our tantalum sputtering targets are the best on the market. Using the latest technology, we make targets that exceed industry standards. Our thorough testing means you get reliable and high-performance products every time.

Product Specifications: AEM Metal's Tantalum Sputtering Targets

Purity: Ta>99.95%, 99.99%, 99.995%, 99.999%
Standard: ASTM B708-05
Density: >16.1g/cc

Tantalum Sputtering Target Specifications

We offer tantalum sputtering targets in 8", 12", and up to the largest 29" diameter round shapes. Below, you'll find a range of standard sizes for our rectangular targets. Should you require a size not listed, please don't hesitate to reach out to us.

Thickness	Tolerance		Width	Tolerance	Length	Tolerance
Thickness	GradeⅠ	gradeⅡ	Width	Tolerance	Length	Tolerance
3-8	±0.1	±0.2	50-400	±0.2	50-1500	±0.2
8-14	±0.1	±0.2	50-350	±0.2	50-1200	±0.2
≥14	±0.1	±0.2	50-300	±0.2	50-1000	±0.2

Customization: Sizes, shapes, and Purity Options

At AEM Metal, we specialize in providing custom tantalum sputtering targets, designed and manufactured to meet the specific needs of your applications.

Custom tantalum sputtering targets allow for greater flexibility and optimization in your coating processes. By tailoring the size, shape, and purity of the target, you can achieve more uniform coatings, enhanced material properties, and improved product performance.

Why Choose Our Tantalum Sputtering Target?

Industry-Leading Expertise and Support

With over 15 years in Tantalum manufacturing, our experienced team offers exceptional customer support and expert technical guidance.

Enhanced Density for Superior Coatings

Our Tantalum sputtering targets, crafted through specialized forming methods, offer high density and uniform microstructure. This ensures consistent coating rates and better coating quality, boosting efficiency in thin film production.

Exceptional Purity Levels:

Our tantalum targets boast an impressive purity of up to 99.95%, ensuring top-tier quality and performance in every application.

Capable of Large-Scale Production

Our manufacturing setup is designed for high production capacities. This allows us to fulfill large orders efficiently without compromising on quality.

Tailored to Specific Applications

Recognizing the diverse needs of our clients, we specialize in application-specific solutions, tailoring our tantalum crucible to your unique requirements.

Tantalum Sputtering Target Application

Tantalum sputtering targets are essential for creating thin films used in many advanced technologies. Here's a brief overview of their key applications:

Semiconductors:

Used in electronics, tantalum targets help produce durable and reliable components like capacitors and resistors, essential for integrated circuits.

Optical Coatings:

Tantalum's resistance to heat and corrosion makes it ideal for coatings on lenses and mirrors, enhancing durability and optical performance.

Medical Devices:

Because tantalum is biocompatible, it's chosen for coatings on implants and surgical tools, offering corrosion resistance and reliability.

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Manufacturing Processes for Tantalum Sputtering Target (Powder Metallurgy)

Advanced Powder Production

AEM Metal uses advanced chemical reduction to create ultra-pure, uniform metal powders. This process is key for high-quality metal products.

Mixing Alloys

Our alloy mixing process is characterized by meticulous precision. This creates alloys with unmatched performance and reliability.

Precision Pressing and Shaping

Using state-of-the-art pressing techniques, we mold our metal powders into desired shapes. Our technology excels in producing complex geometries with high precision.

Cutting-Edge Sintering Process

Our sintering process employs advanced technology. It bonds powder grains effectively, creating dense and robust sinter blocks. This step is crucial for the durability of our products.

Forming for Enhanced Durability

We use unique forming methods to increase material density and strength. Our process ensures our tantalum bars can withstand rigorous applications.

Specialized Heat Treatment

Our heat treatment process is tailored to each product. It fine-tunes the mechanical properties of the metal, ensuring ease of subsequent processing and optimal performance.

Precision Mechanical Processing

AEM Metal offers specialized mechanical processing. Our services include turning, milling, grinding, cutting, joining, and coating. We focus on precision and quality in every step.

Final Product Inspection

Inspect the final Tantalum bar, including dimensional measurements, surface inspection, chemical composition analysis, etc. This ensures that the final product meets specifications.

Tantalum Sputtering Targets: A Comprehensive Guide for Buyer

What is Tantalum Sputtering Target? A Brief Overview

A tantalum sputtering target is made from high-purity tantalum metal, known for its strength and heat resistance. It's used in sputtering to coat surfaces with a thin layer of material. These targets are crafted for durability and to maintain purity in the coating process, making them ideal for electronics and protective coatings. For precise and pure coatings, tantalum targets are essential.

Unique Properties of Tantalum sputtering target

Tantalum sputtering targets are chosen for their special qualities, which include:

1. Heat Resilience

Tantalum has an extremely high melting point, around 3,017°C (5,463°F). This means it can perform under conditions that would melt or damage other materials, maintaining its shape and function even in extreme heat.

2. Corrosion Resistance:

It's notably resistant to chemicals and does not corrode easily, even when exposed to strong acids. This quality ensures that the tantalum coating remains pure and effective over time, protecting devices or parts from degradation.

3. Conductivity:

Tantalum conducts electricity efficiently, which is crucial for applications in electronics where maintaining an electrical path is necessary. This property makes it ideal for thin films in circuits and chips, contributing to their overall performance.

4. Biocompatibility:

Tantalum is safe for use inside the human body, making it a preferred material for medical implants and devices. Its biocompatibility means it won't react adversely with bodily tissues, a critical factor for patient safety and implant longevity.

Quality Control: Tantalum Sputtering Testing

Visual Inspection:

Surface Check: Each target is visually inspected for any surface imperfections such as scratches, pits, or irregularities. Dimensional Accuracy: The thickness, width, and length of the foil are measured to ensure they meet specified tolerances.

Chemical Analysis:

Purity Testing: To confirm the chemical composition and purity of the tantalum, tests like X-ray fluorescence (XRF) and inductively coupled plasma (ICP) are conducted. Trace Elements Analysis: Identifying trace elements is crucial to ensure the foil's suitability for sensitive applications, especially in electronics and medical fields.

Mechanical Property Testing:

Tensile Strength Test: Determines the target's strength by measuring its resistance to breaking under tension. Elongation Measurement: Assesses the ductility of the target, or how much it can stretch before breaking.

Non-Destructive Testing (NDT):

Ultrasonic Testing: Ultrasonic waves are used to detect internal flaws or inhomogeneities. Radiographic Testing: X-rays or gamma rays are used to inspect the internal structure of the tubes, identifying any internal defects.

Corrosion Resistance Testing:

The target is exposed to various corrosive agents to ensure its resistance, a key property for its use in chemical processing and medical devices.

Thickness Measurement:

Using micrometers or other precise instruments, the exact thickness of the target is verified, as it is a critical factor in many applications.

Certification and Documentation:

After passing all tests, the tantalum sputtering target is certified. A report is provided to the buyer detailing the tests conducted and their results, ensuring traceability and quality assurance.

Mechanical Property Testing

Non-Destructive Testing (NDT)

FAQs of Tantalum Sputtering Target

What applications benefit from tantalum sputtering targets?

Tantalum sputtering targets are integral in the deposition of thin films for semiconductors, capacitors, and thin-film resistors, alongside applications in optical coatings and medical device manufacturing.
Can tantalum sputtering targets be customized?

Yes, tantalum sputtering targets can be customized in terms of size, thickness, and purity to meet specific application requirements. Customization ensures optimal performance and efficiency in the sputtering process.
How do I choose the right tantalum sputtering target for my application?

Selecting the right target involves considering factors such as the required purity, size, and application-specific requirements like electrical conductivity or corrosion resistance. Consulting with the manufacturer or a materials expert can help determine the most suitable target specification for your needs.
How does the grain size of a tantalum target influence its sputtering performance?

Grain size can significantly impact the sputtering efficiency and the film quality. Smaller grain sizes generally lead to more uniform sputtering rates and smoother coatings, enhancing the performance of the deposited layer.
Can tantalum sputtering targets be used for alloy coatings?

Yes, tantalum sputtering targets can be used to deposit alloy coatings by combining tantalum with other materials in the target composition.
How does the choice of bonding material affect the performance of a tantalum sputtering target?

The bonding material, used to attach the target to the backing plate, plays a crucial role in thermal conductivity and mechanical stability during sputtering. Selecting an appropriate bonding material can enhance target cooling and reduce the risk of target cracking or warping.
What support does AEM Metal offer for choosing Tantalum products?

Our tantalum experts are here to help. They assist with technical questions and guide you to the best product for your project.
How can I order Tantalum products from AEM Metal?

Ordering is simple. Start by sending us an inquiry. We'll respond with an official quote. If our products and prices meet your needs, issue a PO or we'll send a PI for your purchase.
What is the lead time for Tantalum orders?

It usually takes 3-4 weeks. Lead times can vary based on the order size and customization requirements. We work closely with our clients to provide accurate delivery timelines.

Request an Tantalum Quote for Your Projects Now

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