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    Vanadium Carbide Sputtering Target

    Vanadium Carbide Sputtering Target
  • Vanadium Carbide Sputtering Target
  • Vanadium Carbide Sputtering Target

    Vanadium carbide is the inorganic compound with the formula VC. It is an extremely hard refractory ceramic material. With a hardness of 9-9.5 Mohs, it is possibly the hardest metal-carbide known. It is of interest because it is prevalent in vanadium metal and alloys. Vanadium Carbide has an elastic modulus of approximately 380 GPa. Vanadium carbide (VC) thin films were deposited on silicon substrates by direct sputtering of a VC target in an argon atmosphere.

    Vanadium Carbide Sputtering Target Properties

    Material Vanadium Carbide
    Chemical Formula VC
    Color/ Appearance Dark grey
    Melting point 2810℃
    Theoretical Density (g/cc) 5.77
    Z Ration 1
    Sputter RF
    Type of Bond  Indium, Elastomer

    Vanadium Carbide Sputtering Target Specifications

    Purity: 99.5%
    Size: Circular: Diameter <= 14inch, Thickness >= 1mm
    Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm

    Vanadium Carbide Sputtering Target Applications

    1. Semiconductorchemical
    2. Vapor deposition (CVD) and physical vapor deposition (PVD) display
    3. Optical applications

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